Vibrational properties of SiO and SiH in amorphous SiOx:H...

Vibrational properties of SiO and SiH in amorphous SiOx:H films (0 ≤ x ≤ 2.0) prepared by plasma-enhanced chemical vapor deposition

L. He, T. Inokuma, Y. Kurata, S. Hasegawa
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
185
Year:
1995
Language:
english
Pages:
262
DOI:
10.1016/0022-3093(94)00681-4
File:
PDF, 939 KB
english, 1995
Conversion to is in progress
Conversion to is failed