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Application of high-intensity vacuum ultraviolet light for amorphous silicon film fabrication using a windowless photochemical vapor deposition system
Tomo Ueno, Yoshinori Sawado, Takeshi Akiyama, Yoshitaka Iwasaki, Koichi Kuroiwa, Yasuo TaruiVolume:
169
Year:
1994
Language:
english
Pages:
288
DOI:
10.1016/0022-3093(94)90323-9
File:
PDF, 352 KB
english, 1994