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The surface reaction in the high-rate growth of a-Si:H,Cl from SiH2Cl2 + SiH4
Masami Nakata, Sigurd WagnerVolume:
198-200
Year:
1996
Language:
english
Pages:
999
DOI:
10.1016/0022-3093(96)00020-8
File:
PDF, 267 KB
english, 1996