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Effect of ion bombardment during plasma CVD on the film properties of a-Si:H studied by IEC plasma CVD
T. Sasaki, Y. IchikawaVolume:
198-200
Year:
1996
Language:
english
Pages:
1012
DOI:
10.1016/0022-3093(96)00024-5
File:
PDF, 295 KB
english, 1996