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Selective deposition of amorphous germanium on Si with respect to SiO2 by organometallic CVD
J. Prokop, R. Merica, F. Glatz, S. Veprek, F.-R. Klingan, W.A. HerrmannVolume:
198-200
Year:
1996
Language:
english
Pages:
1029
DOI:
10.1016/0022-3093(96)00027-0
File:
PDF, 216 KB
english, 1996