Deposition of nanocrystalline silicon films (nc-Si:H) from...

Deposition of nanocrystalline silicon films (nc-Si:H) from a pure ECWR-SiH4 plasma

M. Scheib, B. Schröder, H. Oechsner
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
198-200
Year:
1996
Language:
english
Pages:
899
DOI:
10.1016/0022-3093(96)00078-6
File:
PDF, 296 KB
english, 1996
Conversion to is in progress
Conversion to is failed