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Deposition of nanocrystalline silicon films (nc-Si:H) from a pure ECWR-SiH4 plasma
M. Scheib, B. Schröder, H. OechsnerVolume:
198-200
Year:
1996
Language:
english
Pages:
899
DOI:
10.1016/0022-3093(96)00078-6
File:
PDF, 296 KB
english, 1996