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High-quality polycrystalline silicon thin film prepared by a solid phase crystallization method
T. Matsuyama, N. Terada, T. Baba, T. Sawada, S. Tsuge, K. Wakisaka, S. TsudaVolume:
198-200
Year:
1996
Language:
english
Pages:
945
DOI:
10.1016/0022-3093(96)00091-9
File:
PDF, 387 KB
english, 1996