![](/img/cover-not-exists.png)
Critical behavior of the dielectric properties near the metal-non-metal transition in Cr/p+ a-Si:H/V thin film devices
J. Hu, A.J. Snell, J. Hajto, A.E. Owen, M.J. RoseVolume:
198-200
Year:
1996
Language:
english
Pages:
1221
DOI:
10.1016/0022-3093(96)00115-9
File:
PDF, 284 KB
english, 1996