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Characteristics of a-Si:H films prepared by a novel laminar flow photo-chemical vapor deposition method
Tetsuya Yamaguchi, Yoshinori Iida, Akihiko Furukawa, Yoshiki Ishizuka, Hidetoshi Nozaki, Sohei Manabe, Hiroyuki Tango, Okio YoshidaVolume:
198-200
Year:
1996
Language:
english
Pages:
1021
DOI:
10.1016/0022-3093(96)00163-9
File:
PDF, 224 KB
english, 1996