The chemical vapour deposition of alumina from AlCl3-H2-CO2 on a stoichiometric TiC substrate: A thermodynamic approach
I. Lhermitte-Sebire, R. Colmet, R. Naslain, C. BernardVolume:
118
Year:
1986
Language:
english
Pages:
103
DOI:
10.1016/0022-5088(86)90612-0
File:
PDF, 1.23 MB
english, 1986