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Growth and in-depth distribution of thin metal films on silicon (111) studied by XPS: inelastic peak shape analysis
M. Schleberger, D. Fujita, C. Scharfschwerdt, S. TougaardVolume:
331-333
Year:
1995
Language:
english
Pages:
948
DOI:
10.1016/0039-6028(95)00313-4
File:
PDF, 647 KB
english, 1995