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Influence of carbon monoxide gas on silicon dioxide dry etching
N. Omori, H. Matsuo, S. Watanabe, M. PuschmannVolume:
352-354
Year:
1996
Language:
english
Pages:
993
DOI:
10.1016/0039-6028(95)01313-x
File:
PDF, 401 KB
english, 1996