Sputtering rates and nanoscale cluster production in a...

Nanostructured Materials 1996 Vol. 7; Iss. 5

Sputtering rates and nanoscale cluster production in a hollow-cathode apparatus

A.C. Xenoulis, P. Trouposkiadis, C. Potiriadis, C. Papastaikoudis, A.A. Katsanos, A. Clouvas
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Volume:
7
Year:
1996
Language:
english
Pages:
487
DOI:
10.1016/0965-9773(96)00029-3
File:
PDF, 932 KB
english, 1996
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