The structure and electrical properties of HfTaON high-k films prepared by DIBSD
Tao Yu, Chenggang Jin, Xumin Yang, Yaojun Dong, Haiyan Zhang, Lanjian Zhuge, Xumei Wu, Zhaofeng WuVolume:
258
Year:
2012
Language:
english
Pages:
2959
DOI:
10.1016/j.apsusc.2011.11.015
File:
PDF, 1.02 MB
english, 2012