Effect of post-etch cleaning on Ru-capped extreme ultraviolet lithography photomask
Jisook Oh, Chanhyoung Park, Dongwan Seo, Juneui Jung, Sangwoo LimVolume:
258
Year:
2012
Language:
english
Pages:
4707
DOI:
10.1016/j.apsusc.2012.01.063
File:
PDF, 2.91 MB
english, 2012