Effect of negative substrate bias on the microstructure and mechanical properties of Ti–Si–N films deposited by a hybrid filtered cathodic arc and ion beam sputtering technique
Yujuan Zhang, Yingze Yang, Yuhao Zhai, Pingyu ZhangVolume:
258
Year:
2012
Language:
english
Pages:
6902
DOI:
10.1016/j.apsusc.2012.03.127
File:
PDF, 930 KB
english, 2012