Infrared ellipsometry as an investigation tool of thin layers grown into plasma immersion N+ implanted silicon
M. Gartner, A. Szekeres, S. Alexandrova, P. Osiceanu, M. Anastasescu, M. Stoica, A. Marin, E. Vlaikova, E. HalovaVolume:
258
Year:
2012
Language:
english
Pages:
7202
DOI:
10.1016/j.apsusc.2012.04.033
File:
PDF, 658 KB
english, 2012