Effect of neutral pressure on the He plasma flow measurement in a linear device
E.-K. Park, H.-J. Woo, K.-S. Chung, H. Tanaka, S. Kajita, N. OhnoVolume:
12
Year:
2012
Language:
english
Pages:
1
DOI:
10.1016/j.cap.2012.04.024
File:
PDF, 1.25 MB
english, 2012