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Photooxidation of naphthalenesulfonic acids: Comparison between processes based on O3, O3/activated carbon and UV/H2O2
M. Sánchez-Polo, J. Rivera-Utrilla, J.D. Méndez-Díaz, S. Canonica, U. von GuntenVolume:
68
Year:
2007
Language:
english
Pages:
1821
DOI:
10.1016/j.chemosphere.2007.03.050
File:
PDF, 193 KB
english, 2007