Etching of a-Si:H on c-Si absorber monitored by in situ...

Etching of a-Si:H on c-Si absorber monitored by in situ photoluminescence measurements

Stefanie M. Greil, Nicola Mingirulli, Lars Korte, Korina Hartmann, Andreas Schöpke, Jörg Rappich, Bernd Rech
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Volume:
8
Year:
2011
Language:
english
Pages:
275
DOI:
10.1016/j.egypro.2011.06.135
File:
PDF, 1.11 MB
english, 2011
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