Nickel Silicide Formation Using Excimer Laser Annealing

Energy Procedia 2012 Vol. 27; Iss. none

Nickel Silicide Formation Using Excimer Laser Annealing

L. Tous, J-F Lerat, T. Emeraud, R. Negru, K. Huet, A. Uruena, M. Aleman, R. Russell, J. John, J. Poortmans, R. Mertens
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Volume:
27
Year:
2012
Language:
english
Pages:
1
DOI:
10.1016/j.egypro.2012.07.101
File:
PDF, 793 KB
english, 2012
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