A new quantitative Raman measurement scheme using Teflon as...

A new quantitative Raman measurement scheme using Teflon as a novel intensity correction standard as well as the sample container

Sanghee Nah, Donghyuk Kim, Hoeil Chung, Sung-Hwan Han, Moon-Young Yoon
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Volume:
38
Year:
2007
Language:
english
Pages:
8
DOI:
10.1002/jrs.1667
File:
PDF, 325 KB
english, 2007
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