A new measurement and treatment for kinetics of isothermal...

Journal of Alloys and Compounds 2008 Vol. 459; Iss. 1-2

A new measurement and treatment for kinetics of isothermal oxidation of Si3N4

Xin-mei Hou, Kuo-Chih Chou, Xiao-jun Hu, Hai-lei Zhao
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Volume:
459
Year:
2008
Language:
english
DOI:
10.1016/j.jallcom.2007.04.255
File:
PDF, 797 KB
english, 2008
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