Effects of processing parameters on the properties of...

Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering

J. Nazon, J. Sarradin, V. Flaud, J.C. Tedenac, N. Fréty
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Volume:
464
Year:
2008
Language:
english
DOI:
10.1016/j.jallcom.2007.10.027
File:
PDF, 865 KB
english, 2008
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