![](/img/cover-not-exists.png)
Effects of processing parameters on the properties of tantalum nitride thin films deposited by reactive sputtering
J. Nazon, J. Sarradin, V. Flaud, J.C. Tedenac, N. FrétyVolume:
464
Year:
2008
Language:
english
DOI:
10.1016/j.jallcom.2007.10.027
File:
PDF, 865 KB
english, 2008