The properties of direct current sputtering deposited InN...

Journal of Alloys and Compounds 2009 Vol. 484; Iss. 1-2

The properties of direct current sputtering deposited InN thin films under different gas flow rates

Xing-Min Cai, Fan Ye, Yan-Qing Hao, Dong-Ping Zhang, Zhe-Huang Zhang, Ping Fan
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Volume:
484
Year:
2009
Language:
english
DOI:
10.1016/j.jallcom.2009.05.021
File:
PDF, 1.60 MB
english, 2009
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