The effect of annealing treatment on microstructure and properties of TiN films prepared by unbalanced magnetron sputtering
Yingxue Xi, Huiqing Fan, Weiguo LiuVolume:
496
Year:
2010
Language:
english
DOI:
10.1016/j.jallcom.2010.02.176
File:
PDF, 656 KB
english, 2010