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Atomic layer deposition of TaN and Ta3N5 using pentakis(dimethylamino)tantalum and either ammonia or monomethylhydrazine
Ziwen Fang, Helen C. Aspinall, Rajesh Odedra, Richard J. PotterVolume:
331
Year:
2011
Language:
english
DOI:
10.1016/j.jcrysgro.2011.07.012
File:
PDF, 749 KB
english, 2011