Growth of ZnOx:Al by high-throughput CVD at atmospheric...

Journal of Crystal Growth 2012 Vol. 347; Iss. 1

Growth of ZnOx:Al by high-throughput CVD at atmospheric pressure

A. Illiberi, P.J.P.M. Simons, B. Kniknie, J. van Deelen, M. Theelen, M. Zeman, M. Tijssen, W. Zijlmans, H.L.A.H. Steijvers, D. Habets, A.C. Janssen, E.H.A. Beckers
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Volume:
347
Year:
2012
Language:
english
DOI:
10.1016/j.jcrysgro.2012.03.007
File:
PDF, 844 KB
english, 2012
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