Low frequency plasma deposition and characterization of...

Journal of Non-Crystalline Solids 2004 Vol. 338-340; Iss. none

Low frequency plasma deposition and characterization of Si1−xGex:H,F films

R. Ambrosio, A. Torres, A. Kosarev, A. Ilinski, C. Zúñiga, A.S. Abramov
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Volume:
338-340
Year:
2004
Language:
english
DOI:
10.1016/j.jnoncrysol.2004.02.028
File:
PDF, 442 KB
english, 2004
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