Low temperature–low hydrogen content silicon nitrides thin films deposited by PECVD using dichlorosilane and ammonia mixtures
G. Santana, J. Fandiño, A. Ortiz, J.C. AlonsoVolume:
351
Year:
2005
Language:
english
DOI:
10.1016/j.jnoncrysol.2005.02.007
File:
PDF, 201 KB
english, 2005