An investigation of the role of plasma conditions on the deposition rate of electrochromic vanadium oxide thin films
Michael Seman, Joey Marino, Wenli Yang, Colin A. WoldenVolume:
351
Year:
2005
Language:
english
DOI:
10.1016/j.jnoncrysol.2005.05.016
File:
PDF, 180 KB
english, 2005