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Improvement of the electrical properties of PECVD silicon oxide using high-density and low-ion-energy plasma post-treatment
Chuan Jie Zhong, Hiroaki Tanaka, Shigetoshi Sugawa, Tadahiro OhmiVolume:
351
Year:
2005
Language:
english
DOI:
10.1016/j.jnoncrysol.2005.06.016
File:
PDF, 162 KB
english, 2005