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Physico-chemical processes in metal–oxide–semiconductor transistors with thick gate oxide during high electric field stress
Goran S. Ristić, Momčilo M. Pejović, Aleksandar B. JakšićVolume:
353
Year:
2007
Language:
english
DOI:
10.1016/j.jnoncrysol.2006.09.020
File:
PDF, 389 KB
english, 2007