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Selection of post-growth treatment parameters for atomic layer deposition of structurally disordered TiO2 thin films
S. Dueñas, H. Castán, H. García, L. Bailón, K. Kukli, J. Lu, M. Ritala, M. LeskeläVolume:
354
Year:
2008
Language:
english
DOI:
10.1016/j.jnoncrysol.2007.07.051
File:
PDF, 344 KB
english, 2008