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Microcrystalline silicon–germanium thin films prepared by the chemical transport process using hydrogen radicals
Hiromi Kawauchi, Masao Isomura, Takuya Matsui, Michio KondoVolume:
354
Year:
2008
Language:
english
DOI:
10.1016/j.jnoncrysol.2007.09.019
File:
PDF, 119 KB
english, 2008