Growth and properties of fluorinated plasma oxide for Si...

Growth and properties of fluorinated plasma oxide for Si MOSFET devices

Vishwas Jaju, Vikram Dalal
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Volume:
354
Year:
2008
Language:
english
DOI:
10.1016/j.jnoncrysol.2007.10.103
File:
PDF, 165 KB
english, 2008
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