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Composition of Ge+ and Si+ implanted SiO2/Si layers: Role of oxides in nanocluster formation
H. Krzyżanowska, H. Bubert, J. Żuk, W. SkorupaVolume:
354
Year:
2008
Language:
english
DOI:
10.1016/j.jnoncrysol.2008.06.052
File:
PDF, 216 KB
english, 2008