Hydrogenated nanocrystalline silicon thin film prepared by RF-PECVD at high pressure
Wei Li, Donglin Xia, Huifang Wang, Xiujian ZhaoVolume:
356
Year:
2010
Language:
english
DOI:
10.1016/j.jnoncrysol.2010.07.064
File:
PDF, 519 KB
english, 2010