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Mass and bond density measurements for PECVD a-SiCx:H thin films using Fourier transform-infrared spectroscopy
S.W. King, J. Bielefeld, M. French, W.A. LanfordVolume:
357
Year:
2011
Language:
english
DOI:
10.1016/j.jnoncrysol.2011.07.004
File:
PDF, 966 KB
english, 2011