Optical and structural properties of hydrogenated silicon films prepared by rf-magnetron sputtering at low growth temperatures: Study as function of argon gas dilution
Y. Bouizem, K. Kefif, J.D. Sib, D. Benlakehal, A. Kebab, A. Belfedal, L. ChahedVolume:
358
Year:
2012
Language:
english
DOI:
10.1016/j.jnoncrysol.2011.12.077
File:
PDF, 614 KB
english, 2012