Linking EUV lithography line edge roughness and...

Microelectronic Engineering 2012 Vol. 98; Iss. none

Linking EUV lithography line edge roughness and 16 nm NAND memory performance

Alessandro Vaglio Pret, Pavel Poliakov, Roel Gronheid, Pieter Blomme, Miguel Miranda Corbalan, Wim Dehaene, Diederik Verkest, Jan Van Houdt, Davide Bianchi
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Volume:
98
Year:
2012
Language:
english
DOI:
10.1016/j.mee.2012.04.013
File:
PDF, 880 KB
english, 2012
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