Perfusable multi-scale channels fabricated by integration...

Microelectronic Engineering 2012 Vol. 98; Iss. none

Perfusable multi-scale channels fabricated by integration of nanoimprint lighography (NIL) and UV lithography (UVL)

Gaku Isobe, Isaku Kanno, Hidetoshi Kotera, Ryuji Yokokawa
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Volume:
98
Year:
2012
Language:
english
DOI:
10.1016/j.mee.2012.05.059
File:
PDF, 1.03 MB
english, 2012
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