PNP PIN bipolar phototransistors for high-speed applications built in a 180 nm CMOS process
P. Kostov, W. Gaberl, M. Hofbauer, H. ZimmermannVolume:
74
Year:
2012
Language:
english
DOI:
10.1016/j.sse.2012.04.011
File:
PDF, 1.27 MB
english, 2012