Amorphous silicon deposited at high growth rates near the...

Amorphous silicon deposited at high growth rates near the onset of microcrystallinity

Yoram Lubianiker, Yanyang Tan, J.David Cohen, Gautam Ganguly
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Volume:
266-269
Year:
2000
Language:
english
DOI:
10.1016/s0022-3093(00)00029-6
File:
PDF, 114 KB
english, 2000
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