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Direct formation of crystalline silicon films on an amorphous substrate from chlorinated materials by plasma-enhanced chemical vapor deposition
Hajime Shirai, Sughoan Jung, Yukihiro Fujimura, Yasutake ToyoshimaVolume:
299-302
Year:
2002
Language:
english
DOI:
10.1016/s0022-3093(01)01188-7
File:
PDF, 511 KB
english, 2002