Interface and material characterization of thin Al2O3...

Interface and material characterization of thin Al2O3 layers deposited by ALD using TMA/H2O

L.G. Gosset, J.-F. Damlencourt, O. Renault, D. Rouchon, Ph. Holliger, A. Ermolieff, I. Trimaille, J.-J. Ganem, F. Martin, M.-N. Séméria

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Volume:

303

Year:

2002

Language:

english

DOI:

10.1016/s0022-3093(02)00958-4

File:

PDF, 354 KB

english, 2002

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