Amorphous aluminum silicate films by metal-organic chemical vapor deposition using aluminum-tri-sec-butoxide and tetraethyl orthosilicate
Dong-Hau Kuo, Bo-Yu Cheung, Ren-Jye WuVolume:
324
Year:
2003
Language:
english
DOI:
10.1016/s0022-3093(02)01597-1
File:
PDF, 524 KB
english, 2003