Low defect density amorphous silicon germanium alloy (1.5...

Low defect density amorphous silicon germanium alloy (1.5 eV) deposited at high growth rate under helium dilution in RF-PECVD method

Sukti Hazra, A.R. Middya, Swati Ray
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Volume:
211
Year:
1997
Language:
english
DOI:
10.1016/s0022-3093(96)00631-x
File:
PDF, 549 KB
english, 1997
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