The characteristics before and after annealing of amorphous...

Journal of Non-Crystalline Solids 1997 Vol. 221; Iss. 1

The characteristics before and after annealing of amorphous silicon films prepared by ECR plasma CVD

Moonsang Kang, Jaeyeong Kim, Taehoon Lim, Inhwan Oh, Bupju Jeon, Ilhyun Jung, Chul An
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Volume:
221
Year:
1997
Language:
english
DOI:
10.1016/s0022-3093(97)00424-9
File:
PDF, 193 KB
english, 1997
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