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Surface-sensitive Raman scattering study on a-Si:H network formation process during deposition and H2 plasma annealing
Seiichi Miyazaki, Nobuki Fukuhara, Masataka HiroseVolume:
266-269
Year:
2000
Language:
english
DOI:
10.1016/s0022-3093(99)00729-2
File:
PDF, 229 KB
english, 2000